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Peroxiredoxin 6 基因在學習記憶表現的角色

為了解決th-75jx600w的問題，作者Sarayut Phasuk 這樣論述：

The peroxiredoxin 6 (Prdx6) gene encodes a multifunctional enzyme expressed in many brain regions including the hippocampus. Although PRDX6 can modulate several cellular signaling cascades, its role in the regulation of synaptic plasticity and memory formation is still unknown. Using Prdx6 knockout

(Prdx6-/-) mice, we identified that PRDX6 acts as a suppressor in fear memory formation. The absence of the Prdx6 gene leads to rapid fear acquisition, and enhanced contextual and cued fear memories. This phenomenon was confirmed by the fact that an injection of lentivirus carrying mouse Prdx6 into

the lateral ventricle of Prdx6-/- mice limited the enhanced fear response of these knockout mice. We also found impaired spatial memory and synaptic dysregulation in mice with lack of the Prdx6 gene. Proteomic and western blot analyzes suggested that an increase in the MAPK signaling might be respo

nsible for the memory changes in Prdx6-/- mice. While the increased phosphorylated ERK1/2 in the hippocampus may be associated with an improvement in fear memory, it also leads to a deficit in spatial memory of Prdx6-/- mice. In this study, the distribution of PRDX6 was also identified in the astroc

ytes of the hippocampus, amygdala, and frontal cortex. This study demonstrated that astrocytic PRDX6 played a critical role in the homeostatic regulation of synaptic plasticity and memory performance. Our findings support the potential use of PRDX6 as a therapeutic target of post-traumatic stress di

sorder and Alzheimer’s disease.

氮化鈦鍍膜的熱穩定性分析

為了解決th-75jx600w的問題，作者梅正源 這樣論述：

TiN鍍層廣泛用於機械加工刀具的保護鍍層。本論文探討了TiN 鍍層的熱穩定性。 TiN 通過脈衝直流 (PDC) 濺射沉積技術沉積在矽基板上。本研究在大氣條件下分別在分析儀器中同步加熱(in-situ) 以及預先加熱後再分析(ex-situ) 兩種方式加熱 TiN 鍍層，分析了TiN鍍層的微觀結構特徵、機械性質和熱穩定性。由納米壓痕測定TiN 鍍層的硬度和彈性模量，預先加熱鍍層的硬度和彈性模量隨加熱溫度增高而降低，TiN鍍層的最高硬度和彈性模量分別為23GPa和220GPa。拉曼光譜分析顯示預先加熱的 TiN 鍍層到 400°C 時還具有相當的熱穩定性，但加熱到 600°C 時則完全氧化。此

外 XPS 分析也顯示隨著加熱溫度的增高，鍍層表面形成氧化鈦和氮氧化鈦的趨勢漸趨明顯。將TiN 鍍層置於納米壓痕和拉曼光譜量測儀系統在空氣中的大氣條件下同步加熱的結果如下。拉曼分析顯示加熱至低於 400°C 就會形成表面缺陷，而在高於 500°C 的溫度下會形成氧化物。拉曼光譜顯示TiN 鍍層預先加熱造成的氧化程度高於同步加熱模式者。關鍵詞：TiN鍍層，熱穩定性，同步和預先熱模式，納米壓痕，拉曼光譜，X射線光電子能譜。